Nicolas MARTIN
Nicolas MARTIN
Full Professor, FEMTO-ST Institute, ENSMM Besançon, Université Bourgogne Franche-Comté
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Microstructure modification of amorphous titanium oxide thin films during annealing treatment
N Martin, C Rousselot, D Rondot, F Palmino, R Mercier
Thin solid films 300 (1-2), 113-121, 1997
Structural and mechanical properties of chromium nitride, molybdenum nitride, and tungsten nitride thin films
P Hones, N Martin, M Regula, F Lévy
Journal of Physics D: Applied Physics 36 (8), 1023, 2003
Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique
N Martin, O Banakh, AME Santo, S Springer, R Sanjinés, J Takadoum, ...
Applied Surface Science 185 (1-2), 123-133, 2001
Characterizations of titanium oxide films prepared by radio frequency magnetron sputtering
N Martin, C Rousselot, C Savall, F Palmino
Thin Solid Films 287 (1-2), 154-163, 1996
Glancing angle deposition to modify microstructure and properties of sputter deposited chromium thin films
J Lintymer, J Gavoille, N Martin, J Takadoum
Surface and Coatings Technology 174, 316-323, 2003
Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process
JM Chappé, N Martin, J Lintymer, F Sthal, G Terwagne, J Takadoum
Applied Surface Science 253 (12), 5312-5316, 2007
Influence of zigzag microstructure on mechanical and electrical properties of chromium multilayered thin films
J Lintymer, N Martin, JM Chappe, P Delobelle, J Takadoum
Surface and Coatings Technology 180, 26-32, 2004
Structure and composition of TixAl1− xN thin films sputter deposited using a composite metallic target
JY Rauch, C Rousselot, N Martin
Surface and Coatings Technology 157 (2-3), 138-143, 2002
Enhanced sputtering of titanium oxide, nitride and oxynitride thin films by the reactive gas pulsing technique
N Martin, R Sanjines, J Takadoum, F Lévy
Surface and Coatings Technology 142, 615-620, 2001
Correlation between structural and optical properties of WO3 thin films sputter deposited by glancing angle deposition
C Charles, N Martin, M Devel, J Ollitrault, A Billard
Thin Solid Films 534, 275-281, 2013
Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering
JM Chappe, N Martin, G Terwagne, J Lintymer, J Gavoille, J Takadoum
Thin Solid Films 440 (1-2), 66-73, 2003
The effect of bias power on some properties of titanium and titanium oxide films prepared by rf magnetron sputtering
N Martin, D Baretti, C Rousselot, JY Rauch
Surface and Coatings Technology 107 (2-3), 172-182, 1998
Selective uptake and refolding of globular proteins in coacervate microdroplets
N Martin, M Li, S Mann
Langmuir 32 (23), 5881-5889, 2016
Comparative study of mechanical and tribological properties of CNx and DLC films deposited by PECVD technique
J Takadoum, JY Rauch, JM Cattenot, N Martin
Surface and Coatings Technology 174, 427-433, 2003
Reactive sputtering of TiOxNy coatings by the reactive gas pulsing process. Part I: Pattern and period of pulses
N Martin, J Lintymer, J Gavoille, JM Chappé, F Sthal, J Takadoum, F Vaz, ...
Surface and Coatings technology 201 (18), 7720-7726, 2007
Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering
JM Chappé, N Martin, JF Pierson, G Terwagne, J Lintymer, J Gavoille, ...
Applied Surface Science 225 (1-4), 29-38, 2004
Energy distribution of ions bombarding TiO2 thin films during sputter deposition
N Martin, AME Santo, R Sanjines, F Levy
Surface and Coatings Technology 138 (1), 77-83, 2001
Enhancement of mechanical properties of TiN/AlN multilayers by modifying the number and the quality of interfaces
A Thobor, C Rousselot, C Clement, J Takadoum, N Martin, R Sanjines, ...
Surface and Coatings Technology 124 (2-3), 210-221, 2000
Investigation of Niobium oxynitride thin films deposited by reactive magnetron sputtering
M Fenker, H Kappl, O Banakh, N Martin, JF Pierson
Surface and Coatings Technology 201 (7), 4152-4157, 2006
Property change in multifunctional TiCxOy thin films: Effect of the O/Ti ratio
AC Fernandes, P Carvalho, F Vaz, S Lanceros-Méndez, AV Machado, ...
Thin Solid Films 515 (3), 866-871, 2006
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