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Vikrant Rai
Vikrant Rai
Colorado School of Mines
E-mail confirmado em lamresearch.com
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Surface reaction mechanisms during ozone and oxygen plasma assisted atomic layer deposition of aluminum oxide
VR Rai, V Vandalon, S Agarwal
Langmuir 26 (17), 13732-13735, 2010
1142010
Surface reaction mechanisms during plasma-assisted atomic layer deposition of titanium dioxide
VR Rai, S Agarwal
The Journal of Physical Chemistry C 113 (30), 12962-12965, 2009
752009
Influence of surface temperature on the mechanism of atomic layer deposition of aluminum oxide using an oxygen plasma and ozone
VR Rai, V Vandalon, S Agarwal
Langmuir 28 (1), 350-357, 2012
732012
Surface reaction mechanisms during ozone-based atomic layer deposition of titanium dioxide
VR Rai, S Agarwal
The Journal of Physical Chemistry C 112 (26), 9552-9554, 2008
712008
Mechanism of self-catalytic atomic layer deposition of silicon dioxide using 3-aminopropyl triethoxysilane, water, and ozone
VR Rai, S Agarwal
Chemistry of Materials 23 (9), 2312-2316, 2011
552011
In situ diagnostics for studying gas-surface reactions during thermal and plasma-assisted atomic layer deposition
VR Rai, S Agarwal
Journal of Vacuum Science & Technology A 30 (1), 2012
382012
Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
RP Chaukulkar, NFW Thissen, VR Rai, S Agarwal
Journal of Vacuum Science & Technology A 32 (1), 2014
192014
Study of surface reactions during atomic layer deposition using in situ infrared spectroscopy
RP Chaukulkar, N Thissen, VR Rai, S Agarwal
Abstracts of Papers of the American Chemical Society 242, 2011
12011
Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Isopropoxide and Ozone
V Rai, S Agarwal
ECS Meeting Abstracts, 775, 2008
12008
Investigation of gas-surface interactions during atomic layer deposition
VR Rai
2011-Mines Theses & Dissertations, 2011
2011
Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetraisopropoxide and Ozone
S Agarwal, VR Rai
The 2008 Annual Meeting, 2008
2008
LOW TEMPERATURE HYDROGEN PLASMA-ASSISTED ATOMIC LAYER DEPOSITION OF COPPER STUDIED USING IN SITU INFRARED REFLECTION ABSORPTION SPECTROSCOPY
RPCNFW Thissen, VR Rai, S Agarwal
ENGINEERING THE SURFACES OF GROUP IV MATERIALS FOR ENERGY APPLICATIONS 1001, 117, 0
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