| Transparent amorphous oxide semiconductor thin film transistor JY Kwon, DJ Lee, KB Kim Electronic Materials Letters 7, 1-11, 2011 | 317 | 2011 |
| Structural and Electrical Properties of Atomic Layer Deposited Al‐Doped ZnO Films DJ Lee, HM Kim, JY Kwon, H Choi, SH Kim, KB Kim Advanced Functional Materials 21 (3), 448-455, 2011 | 292 | 2011 |
| Nucleation kinetics of Ru on silicon oxide and silicon nitride surfaces deposited by atomic layer deposition SS Yim, DJ Lee, KS Kim, SH Kim, TS Yoon, KB Kim Journal of Applied Physics 103 (11), 2008 | 101 | 2008 |
| Sub-10-nm nanochannels by self-sealing and self-limiting atomic layer deposition SW Nam, MH Lee, SH Lee, DJ Lee, SM Rossnagel, KB Kim Nano letters 10 (9), 3324-3329, 2010 | 89 | 2010 |
| Low temperature atomic layer deposition of ruthenium thin films using isopropylmethylbenzene-cyclohexadiene-ruthenium and O2 TK Eom, W Sari, KJ Choi, WC Shin, JH Kim, DJ Lee, KB Kim, H Sohn, ... Electrochemical and Solid State Letters 12 (11), D85, 2009 | 84 | 2009 |
| Self-limiting film growth of transparent conducting In2O3 by atomic layer deposition using Trimethylindium and water vapor DJ Lee, JY Kwon, JI Lee, KB Kim The Journal of Physical Chemistry C 115 (31), 15384-15389, 2011 | 75 | 2011 |
| Atomic layer deposition of Ti-doped ZnO films with enhanced electron mobility DJ Lee, KJ Kim, SH Kim, JY Kwon, J Xu, KB Kim Journal of Materials Chemistry C 1 (31), 4761-4769, 2013 | 52 | 2013 |
| Formation of Ru nanotubes by atomic layer deposition onto an anodized aluminum oxide template DJ Lee, SS Yim, KS Kim, SH Kim, KB Kim Electrochemical and Solid State Letters 11 (6), K61, 2008 | 52 | 2008 |
| Highly-conformal p-type copper (I) oxide (Cu 2 O) thin films by atomic layer deposition using a fluorine-free amino-alkoxide precursor H Kim, MY Lee, SH Kim, SI Bae, KY Ko, H Kim, KW Kwon, JH Hwang, ... Applied Surface Science 349, 673-682, 2015 | 48 | 2015 |
| Effect of Al distribution on carrier generation of atomic layer deposited Al-doped ZnO films DJ Lee, JY Kwon, SH Kim, HM Kim, KB Kim Journal of the Electrochemical Society 158 (5), D277, 2011 | 48 | 2011 |
| Infrared and microwave shielding of transparent Al-doped ZnO superlattice grown via atomic layer deposition GE Fernandes, DJ Lee, JH Kim, KB Kim, J Xu Journal of Materials Science 48, 2536-2542, 2013 | 45 | 2013 |
| Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu Y Jang, JB Kim, TE Hong, SJ Yeo, S Lee, EA Jung, BK Park, TM Chung, ... Journal of Alloys and Compounds 663, 651-658, 2016 | 43 | 2016 |
| Self-assembly and continuous growth of hexagonal graphene flakes on liquid Cu SY Cho, MS Kim, M Kim, KJ Kim, HM Kim, DJ Lee, SH Lee, KB Kim Nanoscale 7 (30), 12820-12827, 2015 | 37 | 2015 |
| Ultrasmooth, high electron mobility amorphous In–Zn–O films grown by atomic layer deposition DJ Lee, JY Kwon, J Kim, KJ Kim, YH Cho, SY Cho, SH Kim, J Xu, KB Kim The Journal of Physical Chemistry C 118 (1), 408-415, 2014 | 35 | 2014 |
| A bilayer diffusion barrier of ALD-Ru/ALD-TaCN for direct plating of Cu SH Kim, HT Kim, SS Yim, DJ Lee, KS Kim, HM Kim, KB Kim, H Sohn Journal of The Electrochemical Society 155 (8), H589, 2008 | 35 | 2008 |
| A controlled growth of WN x and WC x thin films prepared by atomic layer deposition JB Kim, B Jang, HJ Lee, WS Han, DJ Lee, TE Hong, SH Kim Materials Letters 168, 218-222, 2016 | 34 | 2016 |
| Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor,(ethylbenzene)(1, 3-butadiene) Ru (0), and … S Yeo, JY Park, SJ Lee, DJ Lee, JH Seo, SH Kim Microelectronic Engineering 137, 16-22, 2015 | 34 | 2015 |
| Nonvolatile memory characteristics of atomic layer deposited Ru nanocrystals with a SiO2/Al2O3 bilayered tunnel barrier DJ Lee, SS Yim, KS Kim, SH Kim, KB Kim Journal of Applied Physics 107 (1), 2010 | 34 | 2010 |
| Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application M Kim, S Nabeya, SM Han, MS Kim, S Lee, HM Kim, SY Cho, DJ Lee, ... ACS Applied Materials & Interfaces 12 (12), 14331-14340, 2020 | 31 | 2020 |
| Atomic layer deposition of Ru nanocrystals with a tunable density and size for charge storage memory device application SS Yim, DJ Lee, KS Kim, MS Lee, SH Kim, KB Kim Electrochemical and Solid State Letters 11 (9), K89, 2008 | 30 | 2008 |
Hyun-Mi KimKorea Electronics Technolgy InstituteE-mail confirmado em keti.re.kr
