Valeria Mondiali
Valeria Mondiali
PhD student, L-NESS Dipartimento di fisica, Politecnico di Milano
E-mail confirmado em mail.polimi.it
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Single particle demultiplexer based on domain wall conduits
A Torti, V Mondiali, A Cattoni, M Donolato, E Albisetti, AM Haghiri-Gosnet, ...
Applied Physics Letters 101 (14), 142405, 2012
292012
Local uniaxial tensile strain in germanium of up to 4% induced by SiGe epitaxial nanostructures
M Bollani, D Chrastina, L Gagliano, L Rossetto, D Scopece, M Barget, ...
Applied Physics Letters 107 (8), 083101, 2015
222015
Dislocation engineering in SiGe on periodic and aperiodic Si (001) templates studied by fast scanning X-ray nanodiffraction
V Mondiali, M Bollani, S Cecchi, MI Richard, T Schülli, G Chahine, ...
Applied Physics Letters 104 (2), 021918, 2014
182014
Metastability and relaxation in tensile SiGe on Ge (001) virtual substrates
J Frigerio, M Lodari, D Chrastina, V Mondiali, G Isella, M Bollani
Journal of Applied Physics 116 (11), 113507, 2014
132014
Lithographically defined low dimensional SiGe nanostripes as silicon stressors
M Bollani, D Chrastina, M Fiocco, V Mondiali, J Frigerio, L Gagliano, ...
Journal of Applied Physics 112 (9), 094318, 2012
102012
Top–down SiGe nanostructures on Ge membranes realized by e-beam lithography and wet etching
V Mondiali, M Lodari, M Borriello, D Chrastina, M Bollani
Microelectronic Engineering 153, 88-91, 2016
82016
Micro and nanofabrication of SiGe/Ge bridges and membranes by wet-anisotropic etching
V Mondiali, M Lodari, D Chrastina, M Barget, E Bonera, M Bollani
Microelectronic Engineering 141, 256-260, 2015
82015
Strain release management in SiGe/Si films by substrate patterning
V Mondiali, M Bollani, D Chrastina, R Rubert, G Chahine, MI Richard, ...
Applied Physics Letters 105 (24), 242103, 2014
42014
Tensile strain in Ge membranes induced by SiGe nanostressors
MR Barget, M Lodari, M Borriello, V Mondiali, D Chrastina, M Bollani, ...
Applied Physics Letters 109 (13), 133109, 2016
32016
Anisotropic extended misfit dislocations in overcritical SiGe films by local substrate patterning
M Bollani, D Chrastina, R Ruggeri, G Nicotra, L Gagliano, E Bonera, ...
Nanotechnology 27 (42), 425301, 2016
32016
Strain in Si or Ge from the Edge Forces of Epitaxial Nanostructures
M Lodari, D Chrastina, V Mondiali, MR Barget, J Frigerio, E Bonera, ...
Nanoscience and Nanotechnology Letters 9 (7), 1128-1131, 2017
2017
SiGe nanostructures inducing tensile strain in suspended germanium membranes.
M Barget, M Lodari, V Mondiali, D Chrastina, M Bollani, E Bonera
E-MRS Fall Meeting 2016, 2016
2016
Strain engineering in Si, Ge and SiGe alloys
V MONDIALI
Italy, 2015
2015
SiGe nano-stressors for Ge strain-engineering
M Barget, M Bollani, D Chrastina, L Gagliano, L Rossetto, D Scopece, ...
12th International Conference on Nanosciences & Nanotechnologies (NN15), 2015
2015
Local uniaxial tensile deformation of germanium up to the 4% threshold by epitaxial nanostructures
L Gagliano, L Rossetto, D Scopece, V Mondiali, M Lodari, A GIORGIONI, ...
European Material Research Society Fall Meeting, 2014
2014
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