EAU guidelines on prostate cancer G Aus, CC Abbou, M Bolla, A Heidenreich, HP Schmid, H Van Poppel, ...
European urology 48 (4), 546-551, 2005
844 2005 Ultrathin high-K metal oxides on silicon: processing, characterization and integration issues EP Gusev, E Cartier, DA Buchanan, M Gribelyuk, M Copel, ...
Microelectronic Engineering 59 (1-4), 341-349, 2001
544 2001 Physical and electrical characterization of Hafnium oxide and Hafnium silicate sputtered films A Callegari, E Cartier, M Gribelyuk, HF Okorn-Schmidt, T Zabel
Journal of Applied Physics 90 (12), 6466-6475, 2001
384 2001 Ultrathin high-K gate stacks for advanced CMOS devices EP Gusev, DA Buchanan, E Cartier, A Kumar, D DiMaria, S Guha, ...
International Electron Devices Meeting. Technical Digest (Cat. No. 01CH37224 …, 2001
378 2001 EAU guidelines on prostate cancer G Aus, CC Abbou, D Pacik, HP Schmid, H Van Poppel, JM Wolff, F Zattoni
European urology 40 (2), 97-101, 2001
204 2001 Characterization of silicon surface preparation processes for advanced gate dielectrics HF Okorn-Schmidt
ibm Journal of Research and Development 43 (3), 351-326, 1999
187 1999 80 nm polysilicon gated n-FETs with ultra-thin Al/sub 2/O/sub 3/gate dielectric for ULSI applications DA Buchanan, EP Gusev, E Cartier, H Okorn-Schmidt, K Rim, ...
International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No …, 2000
179 2000 High mobility p-channel germanium MOSFETs with a thin Ge oxynitride gate dielectric H Shang, H Okorn-Schmidt, KK Chan, M Copel, JA Ott, PM Kozlowski, ...
Digest. International Electron Devices Meeting,, 441-444, 2002
162 2002 Interfacial oxidation process for high-k gate dielectric process integration AW Ballantine, DA Buchanan, EA Cartier, KK Chan, MW Copel, ...
US Patent 6,444,592, 2002
149 2002 The IMEC clean: A new concept for particle and metal removal on Si surfaces M Meuris, PW Mertens, A Opdebeeck, HF Schmidt, M Depas, G Vereecke, ...
Solid State Technology 38 (7), 109-113, 1995
145 1995 High temperature stability of S Guha, EP Gusev, H Okorn-Schmidt, M Copel, LÅ Ragnarsson, ...
Applied Physics Letters 81 (16), 2956-2958, 2002
117 2002 Ultrathin high-K dielectrics grown by atomic layer deposition: a comparative study of ZrO2, HfO2, Y2O3 and Al2O3 EP Gusev, E Cartier, M Copel, M Gribelyuk, DA Buchanan, ...
Electrochemical Society Proceedings 9, 189-195, 2001
74 2001 Impact of the electrochemical properties of silicon wafer surfaces on copper outplating from HF solutions I Teerlinck, PW Mertens, HF Schmidt, M Meuris, MM Heyns
Journal of the Electrochemical Society 143 (10), 3323, 1996
64 1996 Sonic cleaning with an interference signal EE Fisch, GW Gale, HF Okorn-Schmidt, WA Syverson
US Patent 6,276,370, 2001
60 2001 Particle cleaning technologies to meet advanced semiconductor device process requirements HF Okorn-Schmidt, F Holsteyns, A Lippert, D Mui, M Kawaguchi, ...
ECS Journal of Solid State Science and Technology 3 (1), N3069, 2013
56 2013 H2O2 decomposition and its impact on silicon surface roughening and gate oxide integrity HF Schmidt, M Meuris, PW Mertens, ALP Rotondaro, MM Heyns, TQ Hurd, ...
Japanese journal of applied physics 34 (2S), 727, 1995
53 1995 New wet cleaning strategies for obtaining highly reliable thin oxides MM Heyns, S Verhaverbeke, M Meuris, PP Mertens, H Schmidt, M Kubota, ...
MRS Online Proceedings Library (OPL) 315, 35, 1993
47 1993 Tumour markers in prostate cancer: EGTM recommendations A Semjonow, W Albrecht, P Bialk, A Gerl, R Lamerz, HP Schmidt, ...
Anticancer research 19, 2785-2820, 1999
41 1999 High-dielectric constant insulators for FEOL capacitors AW Ballantine, DA Buchanan, EA Cartier, DD Coolbaugh, EP Gousev, ...
US Patent 6,511,873, 2003
38 2003 Enhancement of semiconductor wafer cleaning by chelating agent addition GW Gale, DL Rath, EI Cooper, S Estes, HF Okorn-Schmidt, J Brigante, ...
Journal of the Electrochemical Society 148 (9), G513, 2001
36 2001 
Eduard A CartierIBM Research, T. J. Watson Research CenterE-mail confirmado em us.ibm.com
