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F. Alvarez (https://orcid.org/0000-0002-9393-1298)
F. Alvarez (https://orcid.org/0000-0002-9393-1298)
Full Professor, Instituto de Fisica, Unversidad de Campinas
E-mail confirmado em ifi.unicamp.br - Página inicial
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Electronic structure of nitrogen-carbon alloys (a− CN x) determined by photoelectron spectroscopy
S Souto, M Pickholz, MC Dos Santos, F Alvarez
Physical Review B 57 (4), 2536, 1998
2661998
Surface and electronic structure of titanium dioxide photocatalysts
SA Bilmes, P Mandelbaum, F Alvarez, NM Victoria
The Journal of Physical Chemistry B 104 (42), 9851-9858, 2000
2052000
Nitrogen substitution of carbon in graphite: Structure evolution toward molecular forms
MC Dos Santos, F Alvarez
Physical Review B 58 (20), 13918, 1998
1921998
Electronic structure of hydrogenated carbon nitride films
P Hammer, NM Victoria, F Alvarez
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 16 (5 …, 1998
1911998
Incorporation of nitrogen in carbon nanotubes
R Droppa Jr, P Hammer, ACM Carvalho, MC Dos Santos, F Alvarez
Journal of Non-Crystalline Solids 299, 874-879, 2002
1402002
Influence of the process temperature on the steel microstructure and hardening in pulsed plasma nitriding
LF Zagonel, CA Figueroa, R Droppa Jr, F Alvarez
Surface and Coatings Technology 201 (1-2), 452-457, 2006
1122006
Comprehensive spectroscopic study of nitrogenated carbon nanotubes
R Droppa Jr, CTM Ribeiro, AR Zanatta, MC Dos Santos, F Alvarez
Physical Review B 69 (4), 045405, 2004
982004
Influence of microstructure on the corrosion behavior of nitrocarburized AISI H13 tool steel obtained by pulsed DC plasma
RLO Basso, RJ Candal, CA Figueroa, D Wisnivesky, F Alvarez
Surface and Coatings Technology 203 (10-11), 1293-1297, 2009
872009
The role of hydrogen in nitrogen-containing diamondlike films studied by photoelectron spectroscopy
S Souto, F Alvarez
Applied physics letters 70 (12), 1539-1541, 1997
871997
Chemical (dis) order in a-Si 1− x C x: H for x< 0.6
PI Rovira, F Alvarez
Physical Review B 55 (7), 4426, 1997
851997
Effects of increasing nitrogen concentration on the structure of carbon nitride films deposited by ion beam assisted deposition
P Hammer, NM Victoria, F Alvarez
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 18 (5 …, 2000
722000
Infrared analysis of deuterated carbon–nitrogen films obtained by dual-ion-beam-assisted-deposition
F Alvarez, NM Victoria, P Hammer, FL Freire Jr, MC Dos Santos
Applied physics letters 73 (8), 1065-1067, 1998
721998
Nanosized precipitates in H13 tool steel low temperature plasma nitriding
LF Zagonel, J Bettini, RLO Basso, P Paredez, H Pinto, CM Lepienski, ...
Surface and Coatings Technology 207, 72-78, 2012
702012
Comparative study on the bonding structure of hydrogenated and hydrogen free carbon nitride films with high N content
P Hammer, RG Lacerda, R Droppa Jr, F Alvarez
Diamond and Related Materials 9 (3-6), 577-581, 2000
702000
The influence of different silicon adhesion interlayers on the tribological behavior of DLC thin films deposited on steel by EC-PECVD
F Cemin, LT Bim, CM Menezes, MEHM da Costa, IJR Baumvol, F Alvarez, ...
Surface and Coatings Technology 283, 115-121, 2015
672015
Morphological and magnetic properties of carbon–nickel nanocomposite thin films
FC Fonseca, AS Ferlauto, F Alvarez, GF Goya, RF Jardim
Journal of Applied Physics 97 (4), 2005
632005
Influence of chemical sputtering on the composition and bonding structure of carbon nitride films
P Hammer, F Alvarez
Thin Solid Films 398, 116-123, 2001
632001
A simple method to determine the optical constants and thicknesses of ZnxCd1− xS thin films
J Torres, JI Cisneros, G Gordillo, F Alvarez
Thin Solid Films 289 (1-2), 238-241, 1996
621996
Hard graphitic-like amorphous carbon films with high stress and local microscopic density
RG Lacerda, P Hammer, CM Lepienski, F Alvarez, FC Marques
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 19 (3 …, 2001
612001
Time resolved photoluminescence of porous silicon: Evidence for tunneling limited recombination in a band of localized states
LR Tessler, F Alvarez, O Teschke
Applied physics letters 62 (19), 2381-2383, 1993
611993
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