| Resist outgassing contamination growth results using both photon and electron exposures G Denbeaux, Y Kandel, G Kane, D Alvardo, M Upadhyaya, Y Khopkar, ... Extreme Ultraviolet (EUV) Lithography IV 8679, 126-133, 2013 | 11 | 2013 |
| Mass spectrometer characterization of reactions in photoresists exposed to extreme ultraviolet radiation C Mbanaso, S Kruger, C Higgins, Y Khopkar, A Antohe, B Cardineau, ... Extreme Ultraviolet (EUV) Lithography II 7969, 807-815, 2011 | 10 | 2011 |
| Wavelength dependence of carbon contamination on mirrors with different capping layers P Thomas, L Yankulin, Y Khopkar, R Garg, C Mbanaso, A Antohe, YJ Fan, ... Extreme Ultraviolet (EUV) Lithography 7636, 622-629, 2010 | 5 | 2010 |
| Perylenetetracarboxylic diimide (PTCDI) nanowires for sensing ethyl acetate in wine Y Khopkar, A Kojtari, D Swearer, S Zivanovic, HF Ji Journal of Nanoscience and Nanotechnology 14 (9), 6786-6788, 2014 | 4 | 2014 |
| Single Mesowire Transistor From Perylene Tetracarboxylic Diimide MA Koorie, Y Khopkar, HF Ji, SR Zivanovic IEEE transactions on nanotechnology 11 (3), 448-450, 2012 | 3 | 2012 |
| Criticality of photo track monitoring for lithography defect control N Mowell, B Sheumaker, T Han, J Chaung, S Sanghavi, Y Khopkar, ... 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2019 | 2 | 2019 |
| Evaluating vacuum components for particle performance for EUV lithography Y Khopkar, G Denbeaux, V Jindal Extreme Ultraviolet (EUV) Lithography V 9048, 858-865, 2014 | 1 | 2014 |
| Developing particle detection test bench for vacuum components Y Khopkar, H Herbol, M Upadhyaya, G Denbeaux, V Jindal, P Kearney Extreme Ultraviolet (EUV) Lithography III 8322, 660-666, 2012 | 1 | 2012 |
| Mask qualification of a shifted gate contact issue by physical e-beam inspection and high landing energy SEM review: DI: Defect Inspection and Reduction JG Sheridan, HC Peng, CC Huang, V Aristov, H Nguyen, Y Khopkar, ... 2019 30th Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC …, 2019 | | 2019 |
| Nanoparticle generation and interactions with surfaces in vacuum systems Y Khopkar ProQuest Dissertations Publishing, 2015 | | 2015 |
| Dependence of contamination rates on key parameters in EUV optics Y Khopkar, P Thomas, L Yankulin, R Garg, C Mbanaso, A Antohe, ... Extreme Ultraviolet (EUV) Lithography II 7969, 704-711, 2011 | | 2011 |
| Cross-sectional film characterization of exposure-induced carbon contamination on patterned EUV masks YJ Fan, L Yankulin, A Antohe, P Thomas, R Garg, C Mbanaso, Y Khopkar, ... | | 2010 |
| Ultraviolet photoelectron spectroscopy of pristine poly (sodium poly [2-(3-thienyl)-ethoxy-4-butylsulfonate)(PTEBS) and doped with perylene tetracarboxylicdiimide (PTCDI) nanobelts LR Pinto, Y Khopkar, DK Chambers, M Koorie, O Kizilkaya, YB Losovyj, ... MRS Online Proceedings Library (OPL) 1212, 1212-S11-31, 2009 | | 2009 |
| Characterization and Application of Perylene Tetracarboxylic Diimide Nanobelts Synthesized by Gas Phase Self Assembly YV Khopkar Louisiana Tech University, 2009 | | 2009 |
Greg DenbeauxSUNY Albany, College of Nanotechnology, Science, and EngineeringE-mail confirmado em albany.edu
