| Area selective CVD of metallic films from molybdenum, iron, and ruthenium carbonyl precursors: Use of ammonia to inhibit nucleation on oxide surfaces E Mohimi, ZV Zhang, S Liu, JL Mallek, GS Girolami, JR Abelson Journal of Vacuum Science & Technology A 36 (4), 2018 | 32 | 2018 |
| Area-selective chemical vapor deposition of cobalt from dicobalt octacarbonyl: Enhancement of dielectric-dielectric selectivity by adding a coflow of NH3 Z Zhang, S Liu, G Girolami, J Abelson Journal of Vacuum Science & Technology A 38, 2020 | 14 | 2020 |
| Conformal MgO film grown at high rate at low temperature by forward-directed chemical vapor deposition TK Talukdar, S Liu, Z Zhang, F Harwath, GS Girolami, JR Abelson Journal of Vacuum Science & Technology A 36 (5), 2018 | 13 | 2018 |
| Low temperature chemical vapor deposition of superconducting vanadium nitride thin films E Mohimi, ZV Zhang, JL Mallek, S Liu, BB Trinh, PP Shetty, GS Girolami, ... Journal of Vacuum Science & Technology A 37 (3), 2019 | 11 | 2019 |
| Low temperature chemical vapor deposition of superconducting molybdenum carbonitride thin films E Mohimi, K Canova, Z Zhang, S Liu, JL Mallek, GS Girolami, JR Abelson Journal of Vacuum Science & Technology A 37 (2), 2019 | 10 | 2019 |
| Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors: Synthesis and Characterization of Pt[CH2CMe2CH2CH═CH2]2 and the Impact of … S Liu, Z Zhang, D Gray, L Zhu, JR Abelson, GS Girolami Chemistry of Materials 32 (21), 9316-9334, 2020 | 7 | 2020 |
| Ultrasmooth cobalt films on SiO2 by chemical vapor deposition using a nucleation promoter and a growth inhibitor ZV Zhang, S Liu, GS Girolami, JR Abelson Journal of Vacuum Science & Technology A 39 (2), 2021 | 6 | 2021 |
| Superconformal growth and trench filling using a consumable inhibitor in chemical vapor deposition of Hf1− xVxBy KL Canova, ZV Zhang, GS Girolami, JR Abelson Journal of Vacuum Science & Technology A 39 (1), 2021 | 4 | 2021 |
| Selective chemical vapor deposition of HfB2 on Al2O3 over SiO2 and the acceleration of nucleation on SiO2 by pretreatment with Hf [N (CH3) 2] 4 ZV Zhang, S Liu, GS Girolami, JR Abelson Journal of Vacuum Science & Technology A 39 (2), 2021 | 3 | 2021 |
| Coalescence of ultrathin films by atomic layer deposition or chemical vapor deposition: Models of the minimum thickness based on nucleation and growth rates DK LaFollette, KL Canova, ZV Zhang, JR Abelson Journal of Vacuum Science & Technology A 40 (2), 2022 | 2 | 2022 |
| Platinum ω-Alkenyl Compounds as Chemical Vapor Deposition Precursors. Mechanistic Studies of the Thermolysis of Pt[CH2CMe2CH2CH═CH2]2 in Solution … S Liu, Z Zhang, JR Abelson, GS Girolami Organometallics 39 (21), 3817-3829, 2020 | 2 | 2020 |
| Chemical vapor deposition of magnetic iron-cobalt alloy thin films: Use of ammonia to stabilize growth from carbonyl precursors P Zhang, Z Zhang, JR Abelson, GS Girolami Journal of Vacuum Science & Technology A 36 (6), 2018 | 2 | 2018 |
| Infrared reflection spectroscopy of adsorbed intermediates in real time during chemical vapor deposition of oxides ZV Zhang, GS Girolami, JR Abelson Journal of Vacuum Science & Technology A 39 (6), 2021 | 1 | 2021 |
| Nucleation inhibition and enhancement in chemical vapor deposition Z Zhang University of Illinois at Urbana-Champaign, 2020 | 1 | 2020 |
| Area selective CVD of metallic films using precursor gases and inhibitors JR Abelson, E MOHIMI, GS Girolami, S LIU, Z ZHANG US Patent US11584986B1, 2023 | | 2023 |
| Apparatus For Single Chamber Deposition And Etch J AuBuchon, PA Kraus, TC Chua, J Canducci, H Chen, Z ZHANG, ... US Patent US20220389571A1, 2022 | | 2022 |
| Non-conformal plasma induced ald gapfill H Chen, J AuBuchon, Z Zhang US Patent US20220389580A1, 2022 | | 2022 |
Liu SumengShanghai Jiao Tong UniversityE-mail confirmado em sjtu.edu.cn
